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1

Plasma and ion beam surface treatment of polyethylene

N. Sprang, D. Theirich, J. Engemann

Journal:

Surface and Coatings Technology

Year:

1995

Language:

english

File:

PDF, 813 KB

english, 1995

2

Intermediate gas phase precursors during plasma CVD of HMDSO

D. Theirich, Ch. Soll, F. Leu, J. Engemann

Journal:

Year:

2003

Language:

english

File:

PDF, 192 KB

english, 2003

3

Rapid surface modification of polyethylene in microwave and r.f.-plasmas: comparative study

T. Aumann, D. Theirich, J. Engemann

Journal:

Surface and Coatings Technology

Year:

2001

Language:

english

File:

PDF, 268 KB

english, 2001

4

A novel remote technique for high rate plasma polymerization with radio frequency plasmas

D. Theirich, K.P. Ningel, J. Engemann

Journal:

Surface and Coatings Technology

Year:

1996

Language:

english

File:

PDF, 656 KB

english, 1996

5

Multi-jet hollow cathode discharge for remote polymer deposition

D. Korzec, J. Engemann, M. Mildner, K.-P. Ningel, O. Borgmeier, D. Theirich

Journal:

Surface and Coatings Technology

Year:

1997

Language:

english

File:

PDF, 641 KB

english, 1997

6

Characterizing the remote plasma polymerization of octafluorocyclobutane induced by RF-driven hollow-cathode discharge

K.P. Ningel, D. Theirich, J. Engemann

Journal:

Surface and Coatings Technology

Year:

1998

Language:

english

File:

PDF, 745 KB

english, 1998

7

Surface modification of fluoropolymers by microwave plasmas: FTIR investigations

N. Sprang, D. Theirich, J. Engemann

Journal:

Surface and Coatings Technology

Year:

1998

Language:

english

File:

PDF, 863 KB

english, 1998

8

Process control of a plasma treatment of wool by plasma diagnostics

F. Osenberg, D. Theirich, A. Decker, J. Engemann

Journal:

Surface and Coatings Technology

Year:

1999

Language:

english

File:

PDF, 222 KB

english, 1999

9

Broad pressure range PTFE surface modification with slot antenna microwave discharge

R. Winter, D. Korzec, N. Sprang, D. Theirich, J. Engemann

Journal:

Surface and Coatings Technology

Year:

1995

Language:

english

File:

PDF, 676 KB

english, 1995

10

Remote and direct microwave plasma deposition of HMDSO films: comparative study

D. Korzec, D. Theirich, F. Werner, K. Traub, J. Engemann

Journal:

Surface and Coatings Technology

Year:

1995

Language:

english

File:

PDF, 729 KB

english, 1995

11

Influence of reflected primary ions and nonunity sticking coefficients on film stoichiometry during ion-beam-sputter deposition of multicomponent targets

D. Theirich, J. Engemann

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1991

Language:

english

File:

PDF, 463 KB

english, 1991

12

Field emission observations from CVD diamond-coated silicon emitters

V. Raiko, R. Spitzl, B. Aschermann, D. Theirich, J. Engemann, N. Pupeter, T. Habermann, G. Müller

Journal:

Thin Solid Films

Year:

1996

Language:

english

File:

PDF, 443 KB

english, 1996

13

Atmospheric Pressure Plasma ALD of Titanium Oxide

Theirich, Detlef, Müller, Roman, Zilberberg, Kirill, Trost, Sara, Behrendt, Andreas, Riedl, Thomas

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 595 KB

english, 2013

14

[IEEE 2008 IEEE 35th International Conference on Plasma Science (ICOPS) - Karlsruhe, Germany (2008.06.15-2008.06.19)] 2008 IEEE 35th International Conference on Plasma Science - Atmospherich pressure plasma jets: Concepts and realization of miniaturized jets and jet arrays

Theirich, D., Kedzierski, J., Engemann, J.

Year:

2008

Language:

english

File:

PDF, 30 KB

english, 2008

15

[IEEE Eleventh International Vacuum Microelectronics Conference. IVMC'98 - Asheville, NC, USA (19-24 July 1998)] Eleventh International Vacuum Microelectronics Conference. IVMC'98 (Cat. No.98TH8382) - Local field emission features of oriented diamond films on various silicon substrates

Gohl, A., Raiko, V., Habermann, T., Nau, D., Theirich, D., Muller, G., Engemann, J.

Year:

1998

Language:

english

File:

PDF, 277 KB

english, 1998

16

Local field emission features of thick diamond films on various silicon substrates

Göhl, A., Habermann, T., Nau, D., Müller, G., Raiko, V., Theirich, D., Engemann, J.

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1999

Language:

english

File:

PDF, 709 KB

english, 1999

17

Gas Diffusion Barriers Prepared by Spatial Atmospheric Pressure Plasma Enhanced ALD

Hoffmann, Lukas, Theirich, Detlef, Pack, Sven, Kocak, Firat, Schlamm, Daniel, Hasselmann, Tim, Fahl, Henry, Räupke, André, Gargouri, Hassan, Riedl, Thomas

Journal:

ACS Applied Materials & Interfaces

Year:

2017

Language:

english

File:

PDF, 1.21 MB

english, 2017

18

Gas permeation barriers deposited by atmospheric pressure plasma enhanced atomic layer deposition

Hoffmann, Lukas, Theirich, Detlef, Hasselmann, Tim, Räupke, André, Schlamm, Daniel, Riedl, Thomas

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2016

Language:

english

File:

PDF, 735 KB

english, 2016

19

Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO x as conductive gas diffusion barrier

Hoffmann, Lukas, Theirich, Detlef, Schlamm, Daniel, Hasselmann, Tim, Pack, Sven, Brinkmann, Kai Oliver, Rogalla, Detlef, Peters, Sven, Räupke, André, Gargouri, Hassan, Riedl, Thomas

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2018

Language:

english

File:

PDF, 1.20 MB

english, 2018

20

Spatial Atmospheric Pressure Atomic Layer Deposition of Tin Oxide as Impermeable Electron Extraction Layer for Perovskite Solar Cells with Enhanced Thermal Stability

Hoffmann, Lukas, Brinkmann, Kai Oliver, Malerczyk, Jessica, Rogalla, Detlef, Becker, Tim, Theirich, Detlef, Shutsko, Ivan, Görrn, Patrick, Riedl, Thomas

Journal:

ACS Applied Materials & Interfaces

Year:

2018

Language:

english

File:

PDF, 997 KB

english, 2018

21

A new N-heterocyclic carbene-based silver precursor and its validation in atmospheric pressure plasma enhanced spatial atomic layer deposition of silver thin films

Boysen, Nils, Hasselmann, Tim, Karle, Sarah, Rogalla, Detlef, Theirich, Detlef, Winter, Manuela, Riedl, Thomas, Devi, Anjana

Journal:

Angewandte Chemie

Year:

2018

Language:

english

File:

PDF, 4.25 MB

english, 2018

22

A new N-heterocyclic carbene-based silver precursor and its validation in atmospheric pressure plasma enhanced spatial atomic layer deposition of silver thin films

Boysen, Nils, Hasselmann, Tim, Karle, Sarah, Rogalla, Detlef, Theirich, Detlef, Winter, Manuela, Riedl, Thomas, Devi, Anjana

Journal:

Angewandte Chemie International Edition

Year:

2018

Language:

english

File:

PDF, 4.25 MB

english, 2018

23

A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

Boysen, Nils, Misimi, Bujamin, Muriqi, Arbresha, Wree, Jan-Lucas, Hasselmann, Tim, Rogalla, Detlef, Haeger, Tobias, Theirich, Detlef, Nolan, Michael, Riedl, Thomas, Devi, Anjana

Journal:

Chemical Communications

Year:

2020

File:

PDF, 1.21 MB

2020